@@ -350,13 +350,18 @@ should be created for each configuration that requires a change in the
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instrument calibration (wavelength, detector distance, detector
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translation) or scan angles.
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+ The detector is chosen from a pull-down menu that contains all the
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+ detectors defined in the *PyFAI * package. This defines the number of
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+ pixels, their size, and a mask array used to exclude all the pixels
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+ within gaps between the detector chips.
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+
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Calibrate Powder
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----------------
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This dialog will import a TIFF or CBF file containing measurements of a
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powder calibrant and refine the detector position and coordinates, using
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- the PyFAI API. Alternatively, if the calibration parameters are already
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- available in a PONI file, they can be directly imported. The resulting
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- powder data and calbration parameters are then saved to the
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+ the * PyFAI * API. Alternatively, if the calibration parameters are
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+ already available in a PONI file, they can be directly imported. The
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+ resulting powder data and calbration parameters are then saved to the
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configuration template previously created using the *New Configuration *
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dialog.
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@@ -441,3 +446,44 @@ powder calibration data and parameters to the configuration file. The
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calibration parameters can also be saved to a PONI file, using the
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"Export Calibration" button. This process should be repeated for each
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entry, after which the dialog can be closed.
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+
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+ Create Mask
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+ -----------
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+ This dialog creates a pixel mask that is used to exclude bad pixels from
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+ further analysis. As described above, when a new configuration file is
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+ created, a pixel mask that excludes gaps between detector chips is
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+ automatically added. Additional pixels can be excluded using this
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+ dialog, either by adding editable shapes that are constructively added
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+ to the existing mask or by importing the mask from an external file,
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+ which can store the mask in any image format. The latter is useful if a
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+ beamline regularly updates a particular detector's mask as bad pixels are identified.
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+
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+ .. warning :: If an external mask is input using "Import Mask", it will
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+ overwrite the existing mask. It is important therefore that
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+ the external pixel mask also excludes the detector gaps.
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+
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+ After launching the dialog, the current mask can be plotted by clicking
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+ on "Plot Mask." This overlays the mask on the powder diffraction data to
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+ enable the center of the beam and other features of the data to be
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+ identified.
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+
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+ .. figure :: /images/create-mask.png
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+ :align: center
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+ :width: 80%
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+
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+ *Create Mask dialog. The translucent red circle shows the circle
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+ created by clicking "Add Shape". *
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+
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+ By clicking on "Add Shape" with either a rectangle or circle selected, a
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+ translucent shape is added to the plot. By default, it is centered on
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+ the beam center, but may be moved by dragging the center of the shape
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+ and/or resized by dragging one of the shape edges. When the shape has
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+ the correct position and size, click on "Add Shape" again for the shape
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+ to be added to the current list. A pull-down menu allows existing shapes
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+ to be selected for removal if necessary.
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+
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+ If a more complicated mask is required, it can be generated by an
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+ external image editor and imported using "Import Mask".
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+
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+ When the mask is complete, click "Save" to save it to the configuration file.
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+
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